Application objects: ultrapure water treatment system with extremely high boron requirements in the integrated circuit and silicon wafer industry
Key technologies: Boron removing resin, polishing resin, boron removing anion bed
Technical advantages:
1）The boron selection resin contains polyhydroxy functional groups and is highly selective to boric acid;
2）The design of stratified bed and the rear-mounted TOC-UV solves the problem of TOC dissolution from boron removal resin;
3）Concentration of produced water B<10 ppt, TOC<2 ppb.
